摘要(yao)：對氧化(hua)鋁陶瓷基片進行(xing)(xing)了系(xi)統(tong)的(de)(de)(de)單(dan)面(mian)(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)拋(pao)光(guang)和雙面(mian)(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)拋(pao)光(guang)試驗，結果(guo)表(biao)明，單(dan)面(mian)(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)拋(pao)光(guang)相對雙面(mian)(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)拋(pao)光(guang)具(ju)有明顯的(de)(de)(de)效率優勢(shi)，獲得單(dan)面(mian)(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)的(de)(de)(de)優化(hua)條(tiao)件為：研(yan)(yan)磨(mo)(mo)壓力15.19kPa，研(yan)(yan)磨(mo)(mo)轉速40r/min，研(yan)(yan)磨(mo)(mo)液流量10ml/min，研(yan)(yan)磨(mo)(mo)液濃度(du)8wt%；以粒度(du)W40、W20和W5的(de)(de)(de)金剛石磨(mo)(mo)料在優化(hua)工藝條(tiao)件下(xia)進行(xing)(xing)粗研(yan)(yan)磨(mo)(mo)、半精研(yan)(yan)磨(mo)(mo)和精研(yan)(yan)磨(mo)(mo)，減薄加工獲得表(biao)面(mian)(mian)(mian)(mian)粗糙度(du)Ra0.12μm的(de)(de)(de)研(yan)(yan)磨(mo)(mo)片，進而采用W0.5的(de)(de)(de)SiC磨(mo)(mo)料進行(xing)(xing)單(dan)面(mian)(mian)(mian)(mian)拋(pao)光(guang)可以獲得平均(jun)表(biao)面(mian)(mian)(mian)(mian)粗糙度(du)Ra10nm的(de)(de)(de)光(guang)滑表(biao)面(mian)(mian)(mian)(mian)。
0前言
氧化(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)瓷(ci)是(shi)一(yi)種(zhong)以(yi)氧化(hua)(hua)(hua)(hua)鋁(lv)(lv)（Al2O3）為主體(ti)的(de)陶(tao)(tao)(tao)(tao)瓷(ci)材料(liao)(liao)，是(shi)氧化(hua)(hua)(hua)(hua)物(wu)中較穩定的(de)物(wu)質(zhi)，具有機(ji)(ji)(ji)械(xie)強度高(gao)、硬度大、耐(nai)(nai)(nai)磨(mo)、耐(nai)(nai)(nai)高(gao)溫、耐(nai)(nai)(nai)腐蝕、高(gao)的(de)電(dian)(dian)(dian)絕緣性與低的(de)介(jie)電(dian)(dian)(dian)損耗等(deng)(deng)(deng)特點，廣泛用于(yu)機(ji)(ji)(ji)械(xie)、化(hua)(hua)(hua)(hua)工、生(sheng)物(wu)醫(yi)學、電(dian)(dian)(dian)子電(dian)(dian)(dian)力、航(hang)天航(hang)空(kong)(kong)等(deng)(deng)(deng)領域[1]。在(zai)機(ji)(ji)(ji)械(xie)方(fang)面(mian)可以(yi)制(zhi)造(zao)各種(zhong)陶(tao)(tao)(tao)(tao)瓷(ci)刀具、球(qiu)閥、磨(mo)輪、陶(tao)(tao)(tao)(tao)瓷(ci)釘、軸承等(deng)(deng)(deng)；在(zai)電(dian)(dian)(dian)子電(dian)(dian)(dian)力方(fang)面(mian)可以(yi)制(zhi)成(cheng)氧化(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)瓷(ci)底板、基片、陶(tao)(tao)(tao)(tao)瓷(ci)膜以(yi)及各種(zhong)電(dian)(dian)(dian)絕緣瓷(ci)件、電(dian)(dian)(dian)子材料(liao)(liao)、磁性材料(liao)(liao)等(deng)(deng)(deng)；在(zai)化(hua)(hua)(hua)(hua)工方(fang)面(mian)可以(yi)制(zhi)成(cheng)氧化(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)瓷(ci)化(hua)(hua)(hua)(hua)工填料(liao)(liao)球(qiu)、無機(ji)(ji)(ji)微(wei)濾膜、耐(nai)(nai)(nai)磨(mo)蝕涂(tu)層等(deng)(deng)(deng)；在(zai)醫(yi)學方(fang)面(mian)可以(yi)制(zhi)造(zao)人(ren)工骨、人(ren)工關節、人(ren)工牙齒等(deng)(deng)(deng)；在(zai)建(jian)筑衛生(sheng)陶(tao)(tao)(tao)(tao)瓷(ci)方(fang)面(mian)可以(yi)制(zhi)成(cheng)氧化(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)瓷(ci)襯磚、研磨(mo)介(jie)質(zhi)、陶(tao)(tao)(tao)(tao)瓷(ci)保護管、氧化(hua)(hua)(hua)(hua)鋁(lv)(lv)球(qiu)磨(mo)介(jie)質(zhi)等(deng)(deng)(deng)；在(zai)航(hang)空(kong)(kong)航(hang)天方(fang)面(mian)通過制(zhi)備(bei)高(gao)溫耐(nai)(nai)(nai)熱(re)纖維(wei)，用于(yu)航(hang)天飛機(ji)(ji)(ji)上(shang)的(de)隔熱(re)瓦和柔性隔熱(re)材料(liao)(liao)等(deng)(deng)(deng)[2-4]。
氧化(hua)鋁陶(tao)瓷(ci)(ci)(ci)基片(pian)，是在96%~99%氧化(hua)鋁陶(tao)瓷(ci)(ci)(ci)材料中添加了適(shi)量的礦物(wu)原(yuan)料燒結而成的電(dian)子陶(tao)瓷(ci)(ci)(ci)基片(pian)，對膜電(dian)路(lu)(lu)元件及(ji)外貼(tie)切(qie)元件起支撐底座的作用(yong)(yong)。由于氧化(hua)鋁陶(tao)瓷(ci)(ci)(ci)基片(pian)具有耐高溫、電(dian)絕緣(yuan)性能好、介電(dian)常數(shu)和介質損耗低(di)、熱導率大、化(hua)學穩(wen)定性好、與元件的熱膨脹系數(shu)相近等(deng)優點，并且價(jia)格(ge)便(bian)宜，因而廣泛應用(yong)(yong)于薄膜集成電(dian)路(lu)(lu)、厚/薄膜混(hun)合集成電(dian)路(lu)(lu)及(ji)各種薄膜元器件（如薄膜電(dian)容、PTC電(dian)阻等(deng)）中[5]。作為襯底的電(dian)子陶(tao)瓷(ci)(ci)(ci)基片(pian)，其厚度(du)(du)和表面質量均是十(shi)分重要的指標[6]，因而需要對氧化(hua)鋁陶(tao)瓷(ci)(ci)(ci)進行機(ji)械(xie)加工以獲得所需厚度(du)(du)及(ji)表面粗糙度(du)(du)。
氧(yang)化(hua)(hua)鋁(lv)(lv)(lv)陶(tao)(tao)瓷(ci)基(ji)片(pian)作為一種較(jiao)常用的(de)電子(zi)陶(tao)(tao)瓷(ci)基(ji)片(pian)，國內(nei)外學者做了(le)(le)(le)(le)(le)大量深入的(de)研(yan)(yan)(yan)究。Jeong-DuKim等(deng)人[7]通(tong)過一種統計設(she)計試驗方(fang)法分析(xi)了(le)(le)(le)(le)(le)精密陶(tao)(tao)瓷(ci)Al2O3的(de)研(yan)(yan)(yan)磨(mo)(mo)特性，并確(que)定了(le)(le)(le)(le)(le)較(jiao)優的(de)工藝變量組合以(yi)實現表面(mian)(mian)(mian)粗糙(cao)度的(de)較(jiao)大改善。張(zhang)昌(chang)娟等(deng)人[8]通(tong)過不同振動模式下(xia)的(de)Al2O3普(pu)通(tong)與(yu)很聲研(yan)(yan)(yan)磨(mo)(mo)對(dui)(dui)(dui)比試驗，探討了(le)(le)(le)(le)(le)各研(yan)(yan)(yan)磨(mo)(mo)參(can)數(shu)對(dui)(dui)(dui)工件表面(mian)(mian)(mian)粗糙(cao)度影響(xiang)的(de)主次(ci)順序和(he)規律(lv)。鄭建新等(deng)人[9]通(tong)過對(dui)(dui)(dui)Al2O3陶(tao)(tao)瓷(ci)進(jin)(jin)行(xing)蠕動進(jin)(jin)給(gei)很聲磨(mo)(mo)削和(he)機(ji)械磨(mo)(mo)削對(dui)(dui)(dui)比試驗研(yan)(yan)(yan)究，探索了(le)(le)(le)(le)(le)各加(jia)工參(can)數(shu)對(dui)(dui)(dui)磨(mo)(mo)削表面(mian)(mian)(mian)質量的(de)影響(xiang)規律(lv)。本文為了(le)(le)(le)(le)(le)優選(xuan)適于氧(yang)化(hua)(hua)鋁(lv)(lv)(lv)陶(tao)(tao)瓷(ci)基(ji)片(pian)進(jin)(jin)行(xing)快速減(jian)薄(bo)及(ji)拋(pao)光的(de)加(jia)工工藝，系(xi)統研(yan)(yan)(yan)究了(le)(le)(le)(le)(le)金剛石、碳(tan)化(hua)(hua)硼、碳(tan)化(hua)(hua)硅和(he)氧(yang)化(hua)(hua)鋁(lv)(lv)(lv)等(deng)四種磨(mo)(mo)料，在雙(shuang)面(mian)(mian)(mian)研(yan)(yan)(yan)磨(mo)(mo)和(he)單面(mian)(mian)(mian)研(yan)(yan)(yan)磨(mo)(mo)的(de)加(jia)工方(fang)式下(xia)對(dui)(dui)(dui)氧(yang)化(hua)(hua)鋁(lv)(lv)(lv)陶(tao)(tao)瓷(ci)加(jia)工效果(guo)的(de)影響(xiang)，分析(xi)了(le)(le)(le)(le)(le)研(yan)(yan)(yan)磨(mo)(mo)壓力、研(yan)(yan)(yan)磨(mo)(mo)盤轉(zhuan)速、研(yan)(yan)(yan)磨(mo)(mo)液流量、研(yan)(yan)(yan)磨(mo)(mo)液濃(nong)度和(he)磨(mo)(mo)料粒(li)度等(deng)工藝參(can)數(shu)對(dui)(dui)(dui)研(yan)(yan)(yan)磨(mo)(mo)效果(guo)的(de)影響(xiang)。
1實驗條件
試(shi)驗采用50mm×50mm的氧(yang)化鋁陶(tao)瓷燒結片（莫氏硬度9~9.1）為(wei)試(shi)件，原始(shi)表面粗糙度約為(wei)Ra0.1μm，如圖1所示。
采(cai)用(yong)UNIPOL-160D雙(shuang)面研(yan)(yan)(yan)(yan)磨(mo)(mo)拋(pao)光(guang)(guang)機(ji)(ji)（簡稱雙(shuang)面研(yan)(yan)(yan)(yan)磨(mo)(mo)機(ji)(ji)）和(he)KD15BX精(jing)密(mi)平面研(yan)(yan)(yan)(yan)磨(mo)(mo)拋(pao)光(guang)(guang)機(ji)(ji)（簡稱單面研(yan)(yan)(yan)(yan)磨(mo)(mo)機(ji)(ji)）（如圖2所示）對(dui)氧(yang)化鋁陶瓷(ci)基片(pian)進行雙(shuang)面和(he)單面研(yan)(yan)(yan)(yan)磨(mo)(mo)、拋(pao)光(guang)(guang)工(gong)(gong)藝試驗(yan)，優化研(yan)(yan)(yan)(yan)磨(mo)(mo)減薄工(gong)(gong)藝和(he)拋(pao)光(guang)(guang)工(gong)(gong)藝。雙(shuang)面研(yan)(yan)(yan)(yan)磨(mo)(mo)拋(pao)光(guang)(guang)加(jia)工(gong)(gong)時，工(gong)(gong)件采(cai)用(yong)游星(xing)輪保(bao)持架裝夾，采(cai)用(yong)KD15BX精(jing)密(mi)平面研(yan)(yan)(yan)(yan)磨(mo)(mo)拋(pao)光(guang)(guang)機(ji)(ji)加(jia)工(gong)(gong)時，工(gong)(gong)件通(tong)過石蠟黏貼(tie)到陶瓷(ci)盤(pan)上(shang)并正對(dui)研(yan)(yan)(yan)(yan)磨(mo)(mo)盤(pan)進行加(jia)工(gong)(gong)。
使(shi)(shi)用(yong)三豐數顯(xian)測(ce)厚儀測(ce)量氧(yang)化(hua)鋁陶(tao)瓷(ci)基片加工前(qian)后(hou)的厚度，計算得到材(cai)料去(qu)除率；使(shi)(shi)用(yong)S-3400N掃描電子顯(xian)微鏡(jing)（SEM）和(he)OLS4000激光共聚焦顯(xian)微鏡(jing)觀察加工前(qian)后(hou)氧(yang)化(hua)鋁陶(tao)瓷(ci)的表面(mian)形貌(mao)；采用(yong)MahrSurfXR20型表面(mian)粗糙(cao)度儀檢測(ce)表面(mian)粗糙(cao)度。
2實驗結果及其討論
2.1磨(mo)料種類對研磨(mo)減薄(bo)效果的(de)影響
磨(mo)(mo)(mo)料種(zhong)(zhong)類和(he)加工(gong)(gong)方(fang)式(shi)(shi)是影響研磨(mo)(mo)(mo)效果(guo)的(de)重要因素，為了探索磨(mo)(mo)(mo)料種(zhong)(zhong)類和(he)加工(gong)(gong)方(fang)式(shi)(shi)對氧(yang)化(hua)(hua)(hua)鋁(lv)陶瓷基片的(de)影響規律(lv)，采用(yong)W14的(de)金剛石、碳化(hua)(hua)(hua)硼、碳化(hua)(hua)(hua)硅和(he)氧(yang)化(hua)(hua)(hua)鋁(lv)四種(zhong)(zhong)磨(mo)(mo)(mo)料，以相同的(de)工(gong)(gong)藝參數分別在(zai)雙面(mian)研磨(mo)(mo)(mo)機(ji)和(he)單面(mian)研磨(mo)(mo)(mo)機(ji)上對原始(shi)厚度(du)為1mm，粗糙度(du)為Ra0.1μm的(de)氧(yang)化(hua)(hua)(hua)鋁(lv)陶瓷基片進行(xing)加工(gong)(gong)，加工(gong)(gong)結(jie)果(guo)如圖(tu)3所示。
由圖3可見(jian)，對(dui)(dui)于兩種(zhong)加工(gong)(gong)(gong)方式，均具(ju)有相同變(bian)化(hua)(hua)(hua)(hua)趨(qu)勢：材(cai)料(liao)(liao)(liao)去(qu)(qu)除率(lv)和(he)(he)(he)表(biao)(biao)面(mian)(mian)(mian)粗糙(cao)(cao)度均按金剛石(shi)(shi)、碳(tan)(tan)化(hua)(hua)(hua)(hua)硼、碳(tan)(tan)化(hua)(hua)(hua)(hua)硅和(he)(he)(he)氧化(hua)(hua)(hua)(hua)鋁(lv)的(de)(de)(de)(de)(de)順序依次降低(di)(di)，而且單面(mian)(mian)(mian)研(yan)磨(mo)(mo)(mo)(mo)獲得的(de)(de)(de)(de)(de)材(cai)料(liao)(liao)(liao)去(qu)(qu)除率(lv)和(he)(he)(he)表(biao)(biao)面(mian)(mian)(mian)粗糙(cao)(cao)度均比相同條件(jian)(jian)下(xia)雙面(mian)(mian)(mian)研(yan)磨(mo)(mo)(mo)(mo)的(de)(de)(de)(de)(de)結(jie)果(guo)大(da)(da)(da)。其原因(yin)(yin)(yin)可以認為(wei)是：一方面(mian)(mian)(mian)，金剛石(shi)(shi)、碳(tan)(tan)化(hua)(hua)(hua)(hua)硼、碳(tan)(tan)化(hua)(hua)(hua)(hua)硅和(he)(he)(he)氧化(hua)(hua)(hua)(hua)鋁(lv)四種(zhong)磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)的(de)(de)(de)(de)(de)硬度依次降低(di)(di)，磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)顆粒(li)(li)(li)(li)相對(dui)(dui)研(yan)磨(mo)(mo)(mo)(mo)盤(pan)硬度越(yue)(yue)(yue)(yue)大(da)(da)(da)，越(yue)(yue)(yue)(yue)容易嵌入(ru)研(yan)磨(mo)(mo)(mo)(mo)盤(pan)并對(dui)(dui)研(yan)磨(mo)(mo)(mo)(mo)工(gong)(gong)(gong)件(jian)(jian)進(jin)行微切削去(qu)(qu)除，去(qu)(qu)除率(lv)越(yue)(yue)(yue)(yue)高，對(dui)(dui)工(gong)(gong)(gong)件(jian)(jian)表(biao)(biao)面(mian)(mian)(mian)造成(cheng)的(de)(de)(de)(de)(de)損(sun)傷也(ye)越(yue)(yue)(yue)(yue)大(da)(da)(da)，表(biao)(biao)面(mian)(mian)(mian)則(ze)越(yue)(yue)(yue)(yue)粗糙(cao)(cao)；另一方面(mian)(mian)(mian)，磨(mo)(mo)(mo)(mo)粒(li)(li)(li)(li)形(xing)狀(zhuang)也(ye)是影響研(yan)磨(mo)(mo)(mo)(mo)效(xiao)果(guo)的(de)(de)(de)(de)(de)重要因(yin)(yin)(yin)素，金剛石(shi)(shi)和(he)(he)(he)碳(tan)(tan)化(hua)(hua)(hua)(hua)硼磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)顆粒(li)(li)(li)(li)多(duo)數(shu)為(wei)尖狀(zhuang)顆粒(li)(li)(li)(li)且刃邊(bian)明顯(xian)，碳(tan)(tan)化(hua)(hua)(hua)(hua)硅磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)顆粒(li)(li)(li)(li)一部分具(ju)有刃邊(bian)，一部分則(ze)為(wei)鈍(dun)狀(zhuang)顆粒(li)(li)(li)(li)，而氧化(hua)(hua)(hua)(hua)鋁(lv)磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)顆粒(li)(li)(li)(li)則(ze)多(duo)數(shu)為(wei)馬鈴薯狀(zhuang)。在(zai)相同加工(gong)(gong)(gong)條件(jian)(jian)下(xia)，尖狀(zhuang)有刃邊(bian)形(xing)的(de)(de)(de)(de)(de)磨(mo)(mo)(mo)(mo)粒(li)(li)(li)(li)主(zhu)要依靠棱(leng)邊(bian)在(zai)工(gong)(gong)(gong)件(jian)(jian)表(biao)(biao)面(mian)(mian)(mian)進(jin)行微切削和(he)(he)(he)滾(gun)壓，因(yin)(yin)(yin)此磨(mo)(mo)(mo)(mo)粒(li)(li)(li)(li)的(de)(de)(de)(de)(de)加工(gong)(gong)(gong)性能較(jiao)(jiao)高。當磨(mo)(mo)(mo)(mo)粒(li)(li)(li)(li)進(jin)行微切削作(zuo)(zuo)用時，尖狀(zhuang)棱(leng)邊(bian)的(de)(de)(de)(de)(de)顆粒(li)(li)(li)(li)形(xing)狀(zhuang)越(yue)(yue)(yue)(yue)多(duo)的(de)(de)(de)(de)(de)磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)切入(ru)工(gong)(gong)(gong)件(jian)(jian)的(de)(de)(de)(de)(de)深度越(yue)(yue)(yue)(yue)大(da)(da)(da)，工(gong)(gong)(gong)件(jian)(jian)表(biao)(biao)面(mian)(mian)(mian)產(chan)生(sheng)碎片越(yue)(yue)(yue)(yue)多(duo)，表(biao)(biao)面(mian)(mian)(mian)損(sun)傷也(ye)越(yue)(yue)(yue)(yue)多(duo)，則(ze)材(cai)料(liao)(liao)(liao)去(qu)(qu)除率(lv)越(yue)(yue)(yue)(yue)大(da)(da)(da)，表(biao)(biao)面(mian)(mian)(mian)粗糙(cao)(cao)度Ra越(yue)(yue)(yue)(yue)高；當磨(mo)(mo)(mo)(mo)粒(li)(li)(li)(li)進(jin)行滾(gun)壓作(zuo)(zuo)用，且研(yan)磨(mo)(mo)(mo)(mo)壓力大(da)(da)(da)于工(gong)(gong)(gong)件(jian)(jian)材(cai)料(liao)(liao)(liao)的(de)(de)(de)(de)(de)斷裂韌性時，尖狀(zhuang)棱(leng)邊(bian)的(de)(de)(de)(de)(de)顆粒(li)(li)(li)(li)形(xing)狀(zhuang)越(yue)(yue)(yue)(yue)多(duo)的(de)(de)(de)(de)(de)磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)越(yue)(yue)(yue)(yue)容易在(zai)工(gong)(gong)(gong)件(jian)(jian)表(biao)(biao)面(mian)(mian)(mian)產(chan)生(sheng)壓印作(zuo)(zuo)用進(jin)而產(chan)生(sheng)裂紋，此時材(cai)料(liao)(liao)(liao)去(qu)(qu)除率(lv)也(ye)越(yue)(yue)(yue)(yue)大(da)(da)(da)，表(biao)(biao)面(mian)(mian)(mian)粗糙(cao)(cao)度Ra越(yue)(yue)(yue)(yue)高。而鈍(dun)狀(zhuang)和(he)(he)(he)馬鈴薯狀(zhuang)顆粒(li)(li)(li)(li)的(de)(de)(de)(de)(de)磨(mo)(mo)(mo)(mo)料(liao)(liao)(liao)在(zai)工(gong)(gong)(gong)件(jian)(jian)與(yu)研(yan)磨(mo)(mo)(mo)(mo)盤(pan)間(jian)主(zhu)要發生(sheng)滾(gun)動(dong)，對(dui)(dui)工(gong)(gong)(gong)件(jian)(jian)表(biao)(biao)面(mian)(mian)(mian)損(sun)傷較(jiao)(jiao)少，因(yin)(yin)(yin)此材(cai)料(liao)(liao)(liao)去(qu)(qu)除率(lv)較(jiao)(jiao)小，表(biao)(biao)面(mian)(mian)(mian)粗糙(cao)(cao)度Ra較(jiao)(jiao)低(di)(di)。
從試驗結果可以得出，對(dui)于(yu)雙(shuang)面(mian)(mian)(mian)研(yan)磨(mo)(mo)加工(gong)(gong)(gong)方式，采(cai)用金(jin)剛(gang)石和碳化硼磨(mo)(mo)料研(yan)磨(mo)(mo)時，工(gong)(gong)(gong)件(jian)材(cai)(cai)料去除(chu)(chu)率(lv)和表面(mian)(mian)(mian)粗(cu)糙度(du)Ra相差不大，且碳化硼磨(mo)(mo)料經濟成(cheng)本較低，因(yin)此(ci)對(dui)氧化鋁陶瓷進行雙(shuang)面(mian)(mian)(mian)研(yan)磨(mo)(mo)時采(cai)用碳化硼磨(mo)(mo)料經濟性更好；對(dui)于(yu)單(dan)面(mian)(mian)(mian)研(yan)磨(mo)(mo)的(de)加工(gong)(gong)(gong)方式，采(cai)用金(jin)剛(gang)石磨(mo)(mo)料加工(gong)(gong)(gong)時，工(gong)(gong)(gong)件(jian)材(cai)(cai)料去除(chu)(chu)率(lv)是其(qi)他幾種磨(mo)(mo)料的(de)4~5倍，而(er)工(gong)(gong)(gong)件(jian)表面(mian)(mian)(mian)粗(cu)糙度(du)相差不大，因(yin)此(ci)金(jin)剛(gang)石磨(mo)(mo)料適用于(yu)單(dan)面(mian)(mian)(mian)研(yan)磨(mo)(mo)加工(gong)(gong)(gong)。
2.2加工方式的影響
由圖(tu)3同時(shi)(shi)可以看(kan)出(chu)，單(dan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)的(de)(de)工(gong)(gong)(gong)件(jian)材(cai)(cai)料(liao)去除率(lv)(lv)和表面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)粗糙度(du)Ra均比雙面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)高(gao)（而(er)金剛石的(de)(de)材(cai)(cai)料(liao)去除率(lv)(lv)變化尤為(wei)明顯，單(dan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)是(shi)(shi)雙面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)的(de)(de)四倍(bei)），這可能與研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)溝槽(cao)(cao)(cao)的(de)(de)形狀(zhuang)有(you)(you)關，如圖(tu)4所示。圖(tu)4（a）所示是(shi)(shi)單(dan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)采(cai)(cai)用(yong)的(de)(de)是(shi)(shi)細密的(de)(de)環形溝槽(cao)(cao)(cao)，這種(zhong)結構的(de)(de)溝槽(cao)(cao)(cao)能夠(gou)較(jiao)大程度(du)地使(shi)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)液(ye)保留于(yu)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)上而(er)不逸(yi)出(chu)，在相同的(de)(de)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)液(ye)流(liu)量(liang)下(xia)則(ze)有(you)(you)更(geng)(geng)多(duo)的(de)(de)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)料(liao)顆粒作(zuo)用(yong)于(yu)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)工(gong)(gong)(gong)件(jian)，使(shi)得研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)后表面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)材(cai)(cai)料(liao)去除率(lv)(lv)較(jiao)高(gao)；而(er)雙面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)采(cai)(cai)用(yong)的(de)(de)是(shi)(shi)寬(kuan)大的(de)(de)十(shi)字溝槽(cao)(cao)(cao)，如圖(tu)4（b）所示，這種(zhong)結構的(de)(de)溝槽(cao)(cao)(cao)使(shi)得大部分磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)料(liao)填充于(yu)溝槽(cao)(cao)(cao)內部并隨研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)的(de)(de)轉動而(er)逸(yi)出(chu)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)作(zuo)用(yong)區域(yu)，只有(you)(you)少(shao)部分磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)料(liao)作(zuo)用(yong)于(yu)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)與研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)工(gong)(gong)(gong)件(jian)之間，因此在相同的(de)(de)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)液(ye)流(liu)量(liang)下(xia)則(ze)有(you)(you)較(jiao)少(shao)的(de)(de)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)料(liao)顆粒作(zuo)用(yong)于(yu)工(gong)(gong)(gong)件(jian)，使(shi)得研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)后表面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)材(cai)(cai)料(liao)去除率(lv)(lv)較(jiao)低。同時(shi)(shi)，單(dan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)采(cai)(cai)用(yong)的(de)(de)鑄(zhu)鐵(tie)盤(pan)硬度(du)比雙面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)的(de)(de)鑄(zhu)鐵(tie)盤(pan)要低，磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)粒更(geng)(geng)容易在研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)盤(pan)發生鑲嵌而(er)產(chan)生二體摩擦研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)行為(wei)，從(cong)而(er)導致(zhi)單(dan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)的(de)(de)材(cai)(cai)料(liao)去除率(lv)(lv)更(geng)(geng)高(gao)。因此，單(dan)面(mian)(mian)(mian)(mian)(mian)(mian)(mian)(mian)研(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)(yan)磨(mo)(mo)(mo)(mo)(mo)(mo)(mo)的(de)(de)加(jia)工(gong)(gong)(gong)方式(shi)更(geng)(geng)適(shi)合(he)對氧化鋁陶瓷基片進行快(kuai)速減薄加(jia)工(gong)(gong)(gong)。
2.3研磨(mo)壓(ya)力的(de)影響(xiang)
采用(yong)W20的(de)(de)(de)金剛石磨(mo)(mo)(mo)(mo)料(liao)對氧(yang)(yang)化(hua)鋁(lv)陶瓷基片(pian)進行不同研(yan)(yan)磨(mo)(mo)(mo)(mo)壓(ya)力的(de)(de)(de)單面(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)(mo)(mo)試驗，結(jie)果(guo)如圖5所示(shi)。可見，采用(yong)同種磨(mo)(mo)(mo)(mo)料(liao)加(jia)工(gong)時(shi)(shi)(shi)(shi)隨著研(yan)(yan)磨(mo)(mo)(mo)(mo)壓(ya)力的(de)(de)(de)增(zeng)加(jia)，材(cai)料(liao)去(qu)除(chu)(chu)率和表(biao)(biao)面(mian)(mian)(mian)粗(cu)(cu)糙度(du)(du)Ra均(jun)(jun)增(zeng)加(jia)，而當研(yan)(yan)磨(mo)(mo)(mo)(mo)壓(ya)力為(wei)21.52kPa時(shi)(shi)(shi)(shi)陶瓷表(biao)(biao)面(mian)(mian)(mian)開始(shi)出(chu)現顯著劃(hua)痕。這是因(yin)為(wei)隨著研(yan)(yan)磨(mo)(mo)(mo)(mo)壓(ya)力的(de)(de)(de)梯度(du)(du)增(zeng)加(jia)，同一時(shi)(shi)(shi)(shi)間(jian)內研(yan)(yan)磨(mo)(mo)(mo)(mo)區域內的(de)(de)(de)磨(mo)(mo)(mo)(mo)料(liao)顆粒(li)的(de)(de)(de)分壓(ya)增(zeng)加(jia)，對氧(yang)(yang)化(hua)鋁(lv)陶瓷表(biao)(biao)面(mian)(mian)(mian)的(de)(de)(de)切深增(zeng)加(jia)，同時(shi)(shi)(shi)(shi)磨(mo)(mo)(mo)(mo)粒(li)對工(gong)件產生的(de)(de)(de)破碎層也較深，因(yin)而材(cai)料(liao)去(qu)除(chu)(chu)率和表(biao)(biao)面(mian)(mian)(mian)粗(cu)(cu)糙度(du)(du)均(jun)(jun)逐漸增(zeng)大(da)。當壓(ya)力很過(guo)15.19kPa時(shi)(shi)(shi)(shi)，較粗(cu)(cu)的(de)(de)(de)磨(mo)(mo)(mo)(mo)料(liao)壓(ya)入研(yan)(yan)磨(mo)(mo)(mo)(mo)盤的(de)(de)(de)深度(du)(du)較大(da)而轉(zhuan)變為(wei)二體研(yan)(yan)磨(mo)(mo)(mo)(mo)行為(wei)，從(cong)而導致在表(biao)(biao)面(mian)(mian)(mian)微切削過(guo)程中產生劃(hua)痕。因(yin)此，為(wei)了保(bao)證(zheng)氧(yang)(yang)化(hua)鋁(lv)陶瓷表(biao)(biao)面(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)(mo)(mo)后無劃(hua)痕且有較高(gao)材(cai)料(liao)去(qu)除(chu)(chu)率，適(shi)合(he)選用(yong)15.19kPa作為(wei)單面(mian)(mian)(mian)研(yan)(yan)磨(mo)(mo)(mo)(mo)的(de)(de)(de)研(yan)(yan)磨(mo)(mo)(mo)(mo)壓(ya)力。
2.4研磨(mo)盤轉速的影響(xiang)
在不(bu)同的(de)研(yan)磨(mo)(mo)(mo)盤(pan)轉(zhuan)速(su)(su)下(xia)，采(cai)用W20金剛(gang)石磨(mo)(mo)(mo)料對氧化鋁陶瓷(ci)進行單面(mian)(mian)(mian)研(yan)磨(mo)(mo)(mo)實驗，結果(guo)如(ru)圖(tu)6所示(shi)。可見，隨著(zhu)研(yan)磨(mo)(mo)(mo)盤(pan)轉(zhuan)速(su)(su)的(de)提高，材料去除率(lv)(lv)和(he)表(biao)面(mian)(mian)(mian)粗糙度(du)(du)Ra均呈(cheng)增大(da)趨(qu)勢，當轉(zhuan)速(su)(su)為60r/min時，去除率(lv)(lv)較(jiao)高，但基片表(biao)面(mian)(mian)(mian)Ra也較(jiao)高。這是因(yin)為隨著(zhu)研(yan)磨(mo)(mo)(mo)盤(pan)轉(zhuan)速(su)(su)的(de)提高，磨(mo)(mo)(mo)料顆粒在單位(wei)時間內作用于工件(jian)的(de)軌跡(ji)變(bian)多，則(ze)單位(wei)時間內磨(mo)(mo)(mo)粒對工件(jian)的(de)去除量(liang)增加，去除率(lv)(lv)就提高；同時隨著(zhu)轉(zhuan)速(su)(su)的(de)提高，研(yan)磨(mo)(mo)(mo)盤(pan)的(de)振動加大(da)，以(yi)及磨(mo)(mo)(mo)粒在研(yan)磨(mo)(mo)(mo)盤(pan)和(he)工件(jian)間的(de)分布不(bu)均勻，使得工件(jian)表(biao)面(mian)(mian)(mian)去除不(bu)均勻，進而表(biao)面(mian)(mian)(mian)粗糙度(du)(du)Ra增加。從試驗結果(guo)可以(yi)看出，為了保(bao)證較(jiao)高去除量(liang)的(de)同時表(biao)面(mian)(mian)(mian)粗糙度(du)(du)Ra較(jiao)小，研(yan)磨(mo)(mo)(mo)轉(zhuan)速(su)(su)適(shi)宜選用40~50r/min。
2.5研磨(mo)液流量(liang)的(de)影響(xiang)
在不(bu)同的(de)(de)研(yan)(yan)磨(mo)(mo)液(ye)流(liu)量(liang)(liang)(liang)下，采用(yong)金剛石(shi)磨(mo)(mo)料(liao)(liao)對(dui)氧化(hua)鋁陶瓷進(jin)行單面研(yan)(yan)磨(mo)(mo)實驗，結(jie)果如(ru)圖7所示。可見，隨著研(yan)(yan)磨(mo)(mo)液(ye)流(liu)量(liang)(liang)(liang)的(de)(de)增(zeng)(zeng)加，材(cai)料(liao)(liao)去(qu)(qu)(qu)除率(lv)(lv)和加工表(biao)(biao)面粗糙度(du)Ra均先(xian)升高后降低，這是(shi)因為研(yan)(yan)磨(mo)(mo)液(ye)流(liu)量(liang)(liang)(liang)的(de)(de)增(zeng)(zeng)加使得(de)同一(yi)時(shi)間內進(jin)入研(yan)(yan)磨(mo)(mo)區域(yu)的(de)(de)磨(mo)(mo)料(liao)(liao)顆粒(li)(li)數(shu)量(liang)(liang)(liang)增(zeng)(zeng)加，材(cai)料(liao)(liao)去(qu)(qu)(qu)除率(lv)(lv)增(zeng)(zeng)加，當(dang)研(yan)(yan)磨(mo)(mo)液(ye)流(liu)量(liang)(liang)(liang)增(zeng)(zeng)加至一(yi)定程度(du)后，磨(mo)(mo)料(liao)(liao)顆粒(li)(li)在研(yan)(yan)磨(mo)(mo)區域(yu)內的(de)(de)堆積(ji)使得(de)磨(mo)(mo)粒(li)(li)間隙更小，磨(mo)(mo)粒(li)(li)更容(rong)易(yi)發(fa)生滾動(dong)，且一(yi)部分顆粒(li)(li)失去(qu)(qu)(qu)去(qu)(qu)(qu)除作(zuo)用(yong)并逸出，剩(sheng)下另一(yi)部分顆粒(li)(li)進(jin)行去(qu)(qu)(qu)除作(zuo)用(yong)，因此(ci)材(cai)料(liao)(liao)去(qu)(qu)(qu)除率(lv)(lv)下降，同時(shi)對(dui)陶瓷表(biao)(biao)面產生的(de)(de)損(sun)傷減小，表(biao)(biao)面粗糙度(du)Ra減小。從試驗結(jie)果可以看出，當(dang)流(liu)量(liang)(liang)(liang)為10ml/min時(shi)的(de)(de)材(cai)料(liao)(liao)去(qu)(qu)(qu)除率(lv)(lv)與(yu)流(liu)量(liang)(liang)(liang)為20ml/min時(shi)材(cai)料(liao)(liao)的(de)(de)去(qu)(qu)(qu)除率(lv)(lv)相差很(hen)小，但表(biao)(biao)面質量(liang)(liang)(liang)Ra相對(dui)好很(hen)多，所以適合選(xuan)用(yong)流(liu)量(liang)(liang)(liang)為10ml/min的(de)(de)研(yan)(yan)磨(mo)(mo)液(ye)進(jin)行單面研(yan)(yan)磨(mo)(mo)加工，也更節省磨(mo)(mo)料(liao)(liao)。
2.6研磨(mo)液磨(mo)料(liao)濃(nong)度的影響
在不(bu)同的(de)(de)研(yan)磨(mo)(mo)(mo)(mo)(mo)液(ye)磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)濃(nong)度(du)下，采用金(jin)剛(gang)石磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)對氧化鋁陶瓷進行單面(mian)研(yan)磨(mo)(mo)(mo)(mo)(mo)實驗，結果如圖8所示。可見(jian)，隨(sui)著研(yan)磨(mo)(mo)(mo)(mo)(mo)液(ye)磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)濃(nong)度(du)的(de)(de)增(zeng)加(jia)，材料(liao)(liao)(liao)(liao)(liao)去(qu)除(chu)(chu)率和加(jia)工(gong)表(biao)面(mian)粗(cu)糙度(du)Ra均有增(zeng)加(jia)，研(yan)磨(mo)(mo)(mo)(mo)(mo)液(ye)磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)濃(nong)度(du)大于(yu)8wt%時(shi)，材料(liao)(liao)(liao)(liao)(liao)去(qu)除(chu)(chu)率趨(qu)于(yu)平緩(huan)。這是因為(wei)(wei)磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)濃(nong)度(du)較少時(shi)，磨(mo)(mo)(mo)(mo)(mo)粒(li)主要發生二體(ti)摩(mo)擦研(yan)磨(mo)(mo)(mo)(mo)(mo)行為(wei)(wei)，隨(sui)著研(yan)磨(mo)(mo)(mo)(mo)(mo)液(ye)濃(nong)度(du)的(de)(de)增(zeng)加(jia)，參(can)加(jia)加(jia)工(gong)的(de)(de)磨(mo)(mo)(mo)(mo)(mo)粒(li)數量也增(zeng)加(jia)，去(qu)除(chu)(chu)作用增(zeng)強，材料(liao)(liao)(liao)(liao)(liao)去(qu)除(chu)(chu)率升高(gao)。但隨(sui)著磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)濃(nong)度(du)的(de)(de)增(zeng)加(jia)，磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)逐(zhu)漸(jian)轉變為(wei)(wei)三體(ti)摩(mo)擦研(yan)磨(mo)(mo)(mo)(mo)(mo)行為(wei)(wei)，導(dao)致磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)去(qu)除(chu)(chu)率和表(biao)面(mian)粗(cu)糙度(du)逐(zhu)漸(jian)趨(qu)于(yu)飽和。因此(ci)，本實驗的(de)(de)研(yan)磨(mo)(mo)(mo)(mo)(mo)液(ye)磨(mo)(mo)(mo)(mo)(mo)料(liao)(liao)(liao)(liao)(liao)濃(nong)度(du)選用8wt%為(wei)(wei)宜，這樣既能節省研(yan)磨(mo)(mo)(mo)(mo)(mo)液(ye)成本，又(you)能達到趨(qu)于(yu)相同的(de)(de)研(yan)磨(mo)(mo)(mo)(mo)(mo)效果。
2.7磨料(liao)粒(li)度的(de)影響
采(cai)用不(bu)同粒(li)度(du)的(de)金剛石磨(mo)料(liao)(liao)(liao)(liao)對(dui)氧(yang)(yang)化鋁陶(tao)瓷(ci)進行單面(mian)研(yan)磨(mo)實驗(yan)，結果如(ru)圖9所示。由圖9可以看出，隨著磨(mo)料(liao)(liao)(liao)(liao)粒(li)徑的(de)變小(xiao)，材料(liao)(liao)(liao)(liao)的(de)去除(chu)率和表面(mian)粗(cu)糙度(du)均(jun)逐漸下降。這是(shi)因為當磨(mo)料(liao)(liao)(liao)(liao)的(de)粒(li)徑越(yue)(yue)大(da)(da)(da)時，同一時間內(nei)在(zai)研(yan)磨(mo)區(qu)域內(nei)的(de)磨(mo)料(liao)(liao)(liao)(liao)顆(ke)(ke)粒(li)數量越(yue)(yue)少，并且(qie)由于磨(mo)料(liao)(liao)(liao)(liao)的(de)均(jun)勻性問題，必然存在(zai)部分(fen)小(xiao)顆(ke)(ke)粒(li)，大(da)(da)(da)小(xiao)顆(ke)(ke)粒(li)存在(zai)研(yan)磨(mo)區(qu)域內(nei)使得(de)部分(fen)小(xiao)顆(ke)(ke)粒(li)不(bu)受(shou)力(li)，那么在(zai)相同總壓力(li)下每個(ge)受(shou)力(li)顆(ke)(ke)粒(li)的(de)分(fen)壓越(yue)(yue)大(da)(da)(da)，對(dui)氧(yang)(yang)化鋁陶(tao)瓷(ci)表面(mian)的(de)切(qie)深也(ye)越(yue)(yue)大(da)(da)(da)，因此(ci)加工(gong)過(guo)程中(zhong)割劃(hua)表面(mian)獲(huo)得(de)較大(da)(da)(da)的(de)材料(liao)(liao)(liao)(liao)去除(chu)量，同時表面(mian)損傷區(qu)域增大(da)(da)(da)使得(de)表面(mian)粗(cu)糙度(du)Ra變大(da)(da)(da)。
當(dang)磨(mo)(mo)(mo)(mo)料(liao)粒(li)徑越(yue)小時(shi)，同一時(shi)間內(nei)在(zai)研磨(mo)(mo)(mo)(mo)區域內(nei)的(de)磨(mo)(mo)(mo)(mo)料(liao)顆(ke)粒(li)數(shu)量(liang)越(yue)多，且大小顆(ke)粒(li)較為(wei)不明顯使得均(jun)勻性(xing)相對較好，在(zai)相同總壓力下(xia)每個受力顆(ke)粒(li)的(de)分壓則(ze)越(yue)小，對陶瓷表面的(de)切深也越(yue)小，甚至僅去(qu)除表面的(de)原始凸起，因此材料(liao)去(qu)除率較低但表面質量(liang)較好。所以，本實驗(yan)分別選用粒(li)度為(wei)W40、W20和W5的(de)金剛石磨(mo)(mo)(mo)(mo)料(liao)作為(wei)粗研磨(mo)(mo)(mo)(mo)、半精(jing)研磨(mo)(mo)(mo)(mo)和精(jing)研磨(mo)(mo)(mo)(mo)的(de)磨(mo)(mo)(mo)(mo)料(liao)。
結(jie)合上述實驗(yan)結(jie)果，采用研磨(mo)(mo)壓力為15.19kPa，研磨(mo)(mo)盤轉速(su)為40r/min，研磨(mo)(mo)液流量為10ml/min，研磨(mo)(mo)液濃度(du)為8wt%的加工參數，分別以(yi)粒度(du)W40、W20和W5的金剛(gang)石磨(mo)(mo)料進行粗研磨(mo)(mo)、半精研磨(mo)(mo)和精研磨(mo)(mo)，獲得表面粗糙(cao)度(du)Ra0.12μm的研磨(mo)(mo)片。
2.8拋光實驗
在(zai)上述研(yan)磨(mo)(mo)基礎(chu)上，分別在(zai)雙面(mian)(mian)(mian)(mian)拋(pao)(pao)光(guang)(guang)(guang)和(he)單(dan)面(mian)(mian)(mian)(mian)拋(pao)(pao)光(guang)(guang)(guang)的加(jia)工(gong)(gong)方式下，通過粒度(du)(du)W1和(he)W0.5的SiC磨(mo)(mo)料(liao)對研(yan)磨(mo)(mo)后的氧化(hua)鋁陶瓷片(pian)(pian)進(jin)行拋(pao)(pao)光(guang)(guang)(guang)加(jia)工(gong)(gong)，其結果如圖10所示。由圖10（a）可見，當(dang)采用(yong)W1的SiC磨(mo)(mo)料(liao)進(jin)行單(dan)面(mian)(mian)(mian)(mian)拋(pao)(pao)光(guang)(guang)(guang)加(jia)工(gong)(gong)時(shi)，40min可以使(shi)研(yan)磨(mo)(mo)片(pian)(pian)表(biao)面(mian)(mian)(mian)(mian)粗糙(cao)(cao)度(du)(du)Ra從(cong)0.12μm降至(zhi)0.02μm，而雙面(mian)(mian)(mian)(mian)拋(pao)(pao)光(guang)(guang)(guang)加(jia)工(gong)(gong)90min才使(shi)研(yan)磨(mo)(mo)片(pian)(pian)表(biao)面(mian)(mian)(mian)(mian)粗糙(cao)(cao)度(du)(du)Ra從(cong)0.12μm降到0.06μm。由圖10（b）可見，當(dang)采用(yong)W0.5的SiC磨(mo)(mo)料(liao)進(jin)行單(dan)面(mian)(mian)(mian)(mian)拋(pao)(pao)光(guang)(guang)(guang)加(jia)工(gong)(gong)時(shi)，需要(yao)30min可以使(shi)陶瓷片(pian)(pian)表(biao)面(mian)(mian)(mian)(mian)粗糙(cao)(cao)度(du)(du)Ra從(cong)0.02μm降至(zhi)0.01μm，且較低表(biao)面(mian)(mian)(mian)(mian)粗糙(cao)(cao)度(du)(du)可達Ra8.9nm（其表(biao)面(mian)(mian)(mian)(mian)形貌(mao)如圖11所示），而雙面(mian)(mian)(mian)(mian)拋(pao)(pao)光(guang)(guang)(guang)在(zai)30min內只能從(cong)表(biao)面(mian)(mian)(mian)(mian)粗糙(cao)(cao)度(du)(du)Ra0.06μm降至(zhi)Ra0.04μm。
對(dui)(dui)(dui)于單(dan)面(mian)(mian)拋(pao)(pao)光(guang)方式(shi)能更(geng)(geng)(geng)高(gao)效(xiao)(xiao)率(lv)地使(shi)氧(yang)化鋁研磨(mo)(mo)片獲(huo)(huo)得(de)(de)(de)更(geng)(geng)(geng)低的(de)(de)(de)表面(mian)(mian)粗糙(cao)度Ra，其(qi)原(yuan)因可以認為是(shi)：一(yi)方面(mian)(mian)，磨(mo)(mo)料(liao)顆(ke)(ke)粒在(zai)進(jin)入(ru)工(gong)件(jian)(jian)拋(pao)(pao)光(guang)區域前，可能會發生(sheng)團(tuan)聚使(shi)磨(mo)(mo)粒變(bian)大，進(jin)而對(dui)(dui)(dui)工(gong)件(jian)(jian)產生(sheng)損(sun)傷(shang)使(shi)表面(mian)(mian)粗糙(cao)度Ra上(shang)(shang)升(sheng)。而在(zai)單(dan)面(mian)(mian)拋(pao)(pao)光(guang)過程中(zhong)，磨(mo)(mo)料(liao)顆(ke)(ke)粒在(zai)進(jin)入(ru)拋(pao)(pao)光(guang)區域前需(xu)(xu)要經過修整環，修整環除了(le)對(dui)(dui)(dui)陶(tao)瓷貼盤(pan)進(jin)行(xing)定位，還通(tong)過自(zi)身壓(ya)力對(dui)(dui)(dui)產生(sheng)團(tuan)聚的(de)(de)(de)磨(mo)(mo)料(liao)進(jin)行(xing)分離破碎，使(shi)磨(mo)(mo)料(liao)保持均勻粒徑對(dui)(dui)(dui)工(gong)件(jian)(jian)進(jin)行(xing)拋(pao)(pao)光(guang)。因此(ci)在(zai)同種磨(mo)(mo)料(liao)的(de)(de)(de)情(qing)況下(xia)，單(dan)面(mian)(mian)拋(pao)(pao)光(guang)方式(shi)能獲(huo)(huo)得(de)(de)(de)更(geng)(geng)(geng)低的(de)(de)(de)工(gong)件(jian)(jian)表面(mian)(mian)粗糙(cao)度Ra。另一(yi)方面(mian)(mian)，單(dan)面(mian)(mian)拋(pao)(pao)光(guang)是(shi)通(tong)過拋(pao)(pao)光(guang)盤(pan)和圓(yuan)形陶(tao)瓷盤(pan)轉動(dong)完成(cheng)加工(gong)運(yun)動(dong)的(de)(de)(de)，該運(yun)動(dong)產生(sheng)的(de)(de)(de)工(gong)件(jian)(jian)跳(tiao)(tiao)動(dong)較(jiao)(jiao)小，磨(mo)(mo)料(liao)對(dui)(dui)(dui)工(gong)件(jian)(jian)的(de)(de)(de)去(qu)除效(xiao)(xiao)率(lv)較(jiao)(jiao)高(gao)，產生(sheng)的(de)(de)(de)表面(mian)(mian)損(sun)傷(shang)較(jiao)(jiao)少；而雙面(mian)(mian)拋(pao)(pao)光(guang)是(shi)工(gong)件(jian)(jian)裝(zhuang)夾(jia)在(zai)游星輪(lun)(lun)保持架(jia)內，通(tong)過中(zhong)心軸齒(chi)輪(lun)(lun)和外(wai)圈(quan)齒(chi)的(de)(de)(de)嚙合(he)在(zai)上(shang)(shang)下(xia)拋(pao)(pao)光(guang)盤(pan)間(jian)做游星運(yun)動(dong)，該運(yun)動(dong)由(you)于齒(chi)輪(lun)(lun)嚙合(he)產生(sheng)的(de)(de)(de)工(gong)件(jian)(jian)跳(tiao)(tiao)動(dong)較(jiao)(jiao)大，磨(mo)(mo)料(liao)對(dui)(dui)(dui)工(gong)件(jian)(jian)的(de)(de)(de)去(qu)除效(xiao)(xiao)率(lv)較(jiao)(jiao)低，產生(sheng)的(de)(de)(de)表面(mian)(mian)損(sun)傷(shang)較(jiao)(jiao)多。因此(ci)，通(tong)過單(dan)面(mian)(mian)拋(pao)(pao)光(guang)方式(shi)獲(huo)(huo)得(de)(de)(de)相同或更(geng)(geng)(geng)低表面(mian)(mian)粗糙(cao)度Ra所需(xu)(xu)要的(de)(de)(de)時間(jian)更(geng)(geng)(geng)少。
3結論
（1）對氧(yang)化鋁陶瓷進(jin)行(xing)研磨(mo)(mo)(mo)(mo)加(jia)工時，綜合考慮經濟性(xing)和材(cai)料去除率，雙(shuang)面(mian)(mian)(mian)研磨(mo)(mo)(mo)(mo)適(shi)宜采用(yong)碳化硼磨(mo)(mo)(mo)(mo)料，而單(dan)面(mian)(mian)(mian)研磨(mo)(mo)(mo)(mo)適(shi)宜采用(yong)金(jin)剛石(shi)磨(mo)(mo)(mo)(mo)料；單(dan)面(mian)(mian)(mian)研磨(mo)(mo)(mo)(mo)可以(yi)獲(huo)得更高的(de)(de)材(cai)料去除率，雙(shuang)面(mian)(mian)(mian)研磨(mo)(mo)(mo)(mo)可以(yi)獲(huo)得較低的(de)(de)表面(mian)(mian)(mian)粗糙度，同樣單(dan)面(mian)(mian)(mian)拋光方式(shi)能更高效率地使氧(yang)化鋁研磨(mo)(mo)(mo)(mo)片獲(huo)得更低的(de)(de)表面(mian)(mian)(mian)粗糙度。
（2）單(dan)面(mian)研(yan)(yan)磨(mo)(mo)的(de)較優工藝(yi)參(can)數為(wei)(wei)(wei)(wei)(wei)：研(yan)(yan)磨(mo)(mo)壓力為(wei)(wei)(wei)(wei)(wei)15.19kPa，研(yan)(yan)磨(mo)(mo)轉速(su)為(wei)(wei)(wei)(wei)(wei)40r/min，研(yan)(yan)磨(mo)(mo)液流量為(wei)(wei)(wei)(wei)(wei)10ml/min，研(yan)(yan)磨(mo)(mo)液濃度為(wei)(wei)(wei)(wei)(wei)8wt%，分別以粒度W40、W20和(he)W5的(de)金剛(gang)石磨(mo)(mo)料進行粗(cu)研(yan)(yan)磨(mo)(mo)、半精研(yan)(yan)磨(mo)(mo)和(he)精研(yan)(yan)磨(mo)(mo)，快速(su)減(jian)薄獲(huo)得(de)表面(mian)粗(cu)糙度Ra0.12μm的(de)研(yan)(yan)磨(mo)(mo)片。
（3）單(dan)面(mian)(mian)拋(pao)光的(de)拋(pao)光效率與表(biao)面(mian)(mian)質(zhi)量均優于雙面(mian)(mian)拋(pao)光，采用W0.5的(de)SiC磨料可以獲得平均表(biao)面(mian)(mian)粗糙度Ra10nm的(de)光滑表(biao)面(mian)(mian)。參考文獻：
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