鍍液對氧化鋁陶瓷基板的銅鍍層微結構和導電性的影響

摘 要(yao)：目的(de)(de)(de)(de) 化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)是(shi)(shi)氧(yang)化(hua)(hua)(hua)鋁(lv)陶(tao)(tao)瓷(ci)基板(ban)(ban)(ban)金(jin)屬化(hua)(hua)(hua)的(de)(de)(de)(de)一(yi)(yi)種重(zhong)要(yao)手(shou)段(duan)，為(wei)了(le)進一(yi)(yi)步(bu)優化(hua)(hua)(hua)氧(yang)化(hua)(hua)(hua)鋁(lv)陶(tao)(tao)瓷(ci)基板(ban)(ban)(ban)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du) 銅(tong)(tong)(tong)工藝，研究了(le)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)液(ye)(ye)配比（尤其(qi)是(shi)(shi)鍍(du)(du)(du)(du)(du)液(ye)(ye)中(zhong)銅(tong)(tong)(tong)離子和(he)(he)甲醛(quan)含(han)量(liang)(liang)）對氧(yang)化(hua)(hua)(hua)鋁(lv)陶(tao)(tao)瓷(ci)覆銅(tong)(tong)(tong)板(ban)(ban)(ban)微結(jie)構和(he)(he)導(dao)電性(xing)(xing)的(de)(de)(de)(de)影(ying)響。方(fang)法 在(zai)對氧(yang)化(hua)(hua)(hua)鋁(lv)陶(tao)(tao)瓷(ci)基板(ban)(ban)(ban)經過前期(qi)處(chu)理后，采用(yong)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)法在(zai)基板(ban)(ban)(ban)上鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)。采用(yong)X射線衍(yan)射儀(yi)(yi)(yi)、 光學(xue)(xue)顯微鏡(jing)對氧(yang)化(hua)(hua)(hua)鋁(lv)基板(ban)(ban)(ban)上的(de)(de)(de)(de)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)(ceng)物相和(he)(he)形(xing)貌進行觀察。采用(yong)覆層(ceng)(ceng)(ceng)測(ce)(ce)厚(hou)儀(yi)(yi)(yi)、四(si)探針(zhen)測(ce)(ce)試(shi)儀(yi)(yi)(yi)對化(hua)(hua)(hua)學(xue)(xue)銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)層(ceng)(ceng)(ceng)的(de)(de)(de)(de)膜厚(hou)和(he)(he)方(fang)阻進行測(ce)(ce)量(liang)(liang)。結(jie)果XRD結(jie)果表(biao)明，不同配比鍍(du)(du)(du)(du)(du)液(ye)(ye)得到的(de)(de)(de)(de)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)(ceng)均(jun)(jun)具有(you)較(jiao)好(hao)的(de)(de)(de)(de)晶化(hua)(hua)(hua)程度(du)，鍍(du)(du)(du)(du)(du)液(ye)(ye)中(zhong)甲醛(quan)和(he)(he)銅(tong)(tong)(tong)含(han)量(liang)(liang)較(jiao)低的(de)(de)(de)(de)鍍(du)(du)(du)(du)(du)液(ye)(ye)可制備(bei)出晶粒更為(wei)細(xi)小的(de)(de)(de)(de)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)(ceng)。甲醛(quan)和(he)(he)銅(tong)(tong)(tong)離子含(han)量(liang)(liang)均(jun)(jun)較(jiao)高時，沉(chen)積速度(du)過快(kuai)，使鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)(ceng)的(de)(de)(de)(de)均(jun)(jun)勻性(xing)(xing)和(he)(he)致密(mi)性(xing)(xing)不佳(jia)。但當甲醛(quan)含(han)量(liang)(liang)較(jiao)高、銅(tong)(tong)(tong)離子含(han)量(liang)(liang)較(jiao)低時，沉(chen)積速度(du)適中(zhong)，從 而獲得了(le)均(jun)(jun)勻性(xing)(xing)和(he)(he)致密(mi)性(xing)(xing)較(jiao)好(hao)的(de)(de)(de)(de)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)(ceng)，同時這(zhe)種鍍(du)(du)(du)(du)(du)層(ceng)(ceng)(ceng)具有(you)良好(hao)的(de)(de)(de)(de)導(dao)電性(xing)(xing)。結(jie)論(lun)采用(yong)表(biao)面活(huo)性(xing)(xing)化(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)銅(tong)(tong)(tong)工 藝，當鍍(du)(du)(du)(du)(du)液(ye)(ye)中(zhong)甲醛(quan)濃度(du)為(wei)0.25 mol/L和(he)(he)硫(liu)酸銅(tong)(tong)(tong)質量(liang)(liang)濃度(du)為(wei)1.2 g/L時，無需高溫熱處(chu)理，即獲得了(le)均(jun)(jun)勻性(xing)(xing)和(he)(he)致密(mi)性(xing)(xing)俱佳(jia)的(de)(de)(de)(de)銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)層(ceng)(ceng)(ceng)，可滿足覆銅(tong)(tong)(tong)板(ban)(ban)(ban)的(de)(de)(de)(de)使用(yong)要(yao)求(qiu)。

隨著微(wei)電(dian)(dian)子(zi)(zi)技術的(de)(de)(de)(de)(de)(de)迅猛發(fa)展，電(dian)(dian)子(zi)(zi)器(qi)件(jian)趨于(yu)(yu)集成(cheng)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)和(he)(he)多功能(neng)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)，印刷電(dian)(dian)路板(ban)(ban)(ban)(ban)(ban)（也稱電(dian)(dian)子(zi)(zi)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)）已成(cheng)為(wei)一(yi)種不可或(huo)缺(que)的(de)(de)(de)(de)(de)(de)電(dian)(dian)子(zi)(zi)部件(jian)。陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)以其(qi)(qi)(qi)(qi)優良的(de)(de)(de)(de)(de)(de)導(dao)(dao)熱(re)性和(he)(he)氣密性，廣(guang)泛(fan)應(ying)用(yong)(yong)于(yu)(yu)功率電(dian)(dian)子(zi)(zi)、電(dian)(dian)子(zi)(zi)封裝、混(hun)合(he)微(wei)電(dian)(dian)子(zi)(zi)和(he)(he)多芯(xin)片模塊等(deng)(deng)(deng)(deng)(deng)領域。目前(qian)較(jiao)(jiao)(jiao)常用(yong)(yong)的(de)(de)(de)(de)(de)(de)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)材料是氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)，其(qi)(qi)(qi)(qi)具(ju)有與半(ban)導(dao)(dao)體硅相(xiang)匹配(pei)(pei)的(de)(de)(de)(de)(de)(de)熱(re)膨脹系數、高熱(re)穩定(ding)(ding)性、化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)穩定(ding)(ding)性和(he)(he)低介(jie)電(dian)(dian)常數，且價(jia)(jia)格(ge)(ge) 便宜。為(wei)了(le)(le)利用(yong)(yong)氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)，首先應(ying)對其(qi)(qi)(qi)(qi)進(jin)(jin)行金(jin)屬(shu)(shu)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)，即在(zai)(zai)(zai)(zai)氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)形成(cheng)一(yi)層金(jin)屬(shu)(shu)導(dao)(dao)電(dian)(dian)層。目前(qian)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)金(jin)屬(shu)(shu)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)的(de)(de)(de)(de)(de)(de)方法(fa)(fa)(fa)主(zhu)要有高溫(wen)燒結(jie)被銀(yin)法(fa)(fa)(fa)、 真空(kong)蒸發(fa)鍍(du)(du)(du)(du)(du)(du)(du)(du)膜(mo)法(fa)(fa)(fa)、磁控濺射法(fa)(fa)(fa)、化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)氣相(xiang)沉(chen)積法(fa)(fa)(fa)、電(dian)(dian)鍍(du)(du)(du)(du)(du)(du)(du)(du)法(fa)(fa)(fa)等(deng)(deng)(deng)(deng)(deng)。其(qi)(qi)(qi)(qi)中(zhong)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)由(you)于(yu)(yu)具(ju)有設備簡(jian)單、價(jia)(jia)格(ge)(ge)便宜、便于(yu)(yu)批量生(sheng)產(chan)等(deng)(deng)(deng)(deng)(deng)優點(dian)，成(cheng)為(wei)了(le)(le)工(gong)業生(sheng)產(chan)中(zhong)常用(yong)(yong)的(de)(de)(de)(de)(de)(de)一(yi)種方法(fa)(fa)(fa)，國內(nei)外學(xue)(xue)者對氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)上化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue) 鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)工(gong)藝已進(jin)(jin)行了(le)(le)一(yi)系列的(de)(de)(de)(de)(de)(de)研(yan)(yan)究。粗化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)可使陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci) 基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)的(de)(de)(de)(de)(de)(de)部分化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍵受到破(po)壞(huai)，改善基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)的(de)(de)(de)(de)(de)(de)親水性，同(tong)時可增加基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)的(de)(de)(de)(de)(de)(de)粗糙度，從而(er)在(zai)(zai)(zai)(zai)后續敏(min)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)處(chu)(chu)理(li)時能(neng)讓足夠(gou)(gou)的(de)(de)(de)(de)(de)(de)敏(min)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)劑(ji)吸附在(zai)(zai)(zai)(zai)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)，提高鍍(du)(du)(du)(du)(du)(du)(du)(du)層的(de)(de)(de)(de)(de)(de)結(jie)合(he)力。如寧洪龍等(deng)(deng)(deng)(deng)(deng)研(yan)(yan)究了(le)(le)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)粗化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua) 和(he)(he)改性對銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)(du)(du)(du)層結(jie)合(he)力的(de)(de)(de)(de)(de)(de)影響，經過(guo)優化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)，基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)與鍍(du)(du)(du)(du)(du)(du)(du)(du)層間的(de)(de)(de)(de)(de)(de)結(jie)合(he)力能(neng)夠(gou)(gou)達到27 MPa。此(ci)外，由(you)于(yu)(yu)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)自(zi)身不具(ju)有活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)，往往都(dou)是通過(guo)敏(min)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)劑(ji)中(zhong)的(de)(de)(de)(de)(de)(de)二(er)(er) 價(jia)(jia)錫離(li)子(zi)(zi)將貴(gui)(gui)金(jin)屬(shu)(shu)離(li)子(zi)(zi)還原成(cheng)貴(gui)(gui)金(jin)屬(shu)(shu)原子(zi)(zi)來對基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)表(biao)面(mian)(mian)(mian)進(jin)(jin)行修飾。早(zao)期(qi)主(zhu)要是利用(yong)(yong)金(jin)屬(shu)(shu)鈀離(li)子(zi)(zi)進(jin)(jin)行催化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)處(chu)(chu)理(li)，其(qi)(qi)(qi)(qi)價(jia)(jia)格(ge)(ge)相(xiang)對較(jiao)(jiao)(jiao)高且工(gong)藝復雜(za)。硝酸(suan)銀(yin)價(jia)(jia)格(ge)(ge) 相(xiang)對比較(jiao)(jiao)(jiao)便宜，工(gong)藝簡(jian)單，且活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)的(de)(de)(de)(de)(de)(de)效(xiao)果也較(jiao)(jiao)(jiao)好(hao)，在(zai)(zai)(zai)(zai)實驗室及(ji)工(gong)業上逐漸取(qu)代金(jin)屬(shu)(shu)鈀成(cheng)為(wei)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)的(de)(de)(de)(de)(de)(de)新型活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)劑(ji)。國內(nei)外學(xue)(xue)者對化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)液及(ji)鍍(du)(du)(du)(du)(du)(du)(du)(du)層熱(re)處(chu)(chu)理(li)作了(le)(le) 相(xiang)關(guan)(guan)研(yan)(yan)究，如宋秀峰等(deng)(deng)(deng)(deng)(deng)在(zai)(zai)(zai)(zai)氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)上采(cai)用(yong)(yong)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua) 學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)輔(fu)助(zhu)(zhu)高溫(wen)熱(re)處(chu)(chu)理(li)的(de)(de)(de)(de)(de)(de)方法(fa)(fa)(fa)獲得(de)(de)(de)了(le)(le)附著力和(he)(he)導(dao)(dao)電(dian)(dian) 性較(jiao)(jiao)(jiao)好(hao)的(de)(de)(de)(de)(de)(de)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層，袁李(li)俊等(deng)(deng)(deng)(deng)(deng)采(cai)用(yong)(yong)非(fei)貴(gui)(gui)金(jin)屬(shu)(shu)活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)法(fa)(fa)(fa)輔(fu) 助(zhu)(zhu)二(er)(er)次化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)在(zai)(zai)(zai)(zai)氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)成(cheng)功制備了(le)(le)表(biao)面(mian)(mian)(mian)完 整、分布均勻(yun)的(de)(de)(de)(de)(de)(de)銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)(du)(du)(du)層，陳(chen)智棟等(deng)(deng)(deng)(deng)(deng)將分子(zi)(zi)自(zi)組裝技術（硅烷化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)處(chu)(chu)理(li)）與化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)結(jie)合(he)，成(cheng)功地(di)在(zai)(zai)(zai)(zai)氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)上 制得(de)(de)(de)剝(bo)離(li)強度良好(hao)的(de)(de)(de)(de)(de)(de)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)層，由(you)勁博等(deng)(deng)(deng)(deng)(deng)研(yan)(yan)制了(le)(le)一(yi)種針(zhen)對氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)前(qian)處(chu)(chu)理(li)用(yong)(yong)的(de)(de)(de)(de)(de)(de)活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)膠，實現了(le)(le)敏(min)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)活(huo)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)的(de)(de)(de)(de)(de)(de)一(yi)步化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)，簡(jian)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)了(le)(le)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)表(biao)面(mian)(mian)(mian)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)的(de)(de)(de)(de)(de)(de)工(gong)藝 流程。以上采(cai)用(yong)(yong)的(de)(de)(de)(de)(de)(de)各(ge)種氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)上化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)的(de)(de)(de)(de)(de)(de)工(gong)藝雖獲得(de)(de)(de)了(le)(le)良好(hao)的(de)(de)(de)(de)(de)(de)效(xiao)果，但關(guan)(guan)于(yu)(yu)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)(du)(du)(du)液配(pei)(pei)比對銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)(du)(du)(du)層微(wei)結(jie)構和(he)(he)導(dao)(dao)電(dian)(dian)性的(de)(de)(de)(de)(de)(de)影響研(yan)(yan)究不夠(gou)(gou)系統。為(wei)此(ci)，筆(bi)者對氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)采(cai)用(yong)(yong)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)學(xue)(xue)鍍(du)(du)(du)(du)(du)(du)(du)(du)銅(tong)(tong)(tong)的(de)(de)(de)(de)(de)(de)方法(fa)(fa)(fa)實現其(qi)(qi)(qi)(qi)金(jin)屬(shu)(shu)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)，并對含有甲醛、酒石酸(suan)鉀鈉的(de)(de)(de)(de)(de)(de)硫酸(suan)銅(tong)(tong)(tong)堿性鍍(du)(du)(du)(du)(du)(du)(du)(du)液體系配(pei)(pei)比進(jin)(jin)行了(le)(le)對比實驗，研(yan)(yan)究了(le)(le)不同(tong)配(pei)(pei)比的(de)(de)(de)(de)(de)(de)鍍(du)(du)(du)(du)(du)(du)(du)(du)液對 氧(yang)(yang)化(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)(hua)鋁(lv)(lv)陶(tao)(tao)(tao)(tao)(tao)(tao)瓷(ci)基(ji)(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)(ban)的(de)(de)(de)(de)(de)(de)銅(tong)(tong)(tong)鍍(du)(du)(du)(du)(du)(du)(du)(du)層微(wei)結(jie)構和(he)(he)導(dao)(dao)電(dian)(dian)性的(de)(de)(de)(de)(de)(de)影響。

1 實驗

氧化鋁陶瓷基板(ban)(ban)(ban)上化學鍍銅過程(cheng)主要有以(yi)下步驟(zou)。 基板(ban)(ban)(ban)打(da)磨(mo)(mo)：采用96%的氧化鋁陶瓷基板(ban)(ban)(ban)，經(jing)500# 和800#金相砂紙打(da)磨(mo)(mo)以(yi)除(chu)去油污及(ji)雜質，并使表面(mian)獲 得一(yi)定的粗(cu)糙度，而后(hou)分(fen)別用水(shui)、丙(bing)酮、乙醇很(hen)聲波 清洗。

清洗：將基板放入濃度為(wei)1.25 mol/L 的氫氧(yang)化鈉 溶(rong)液中(zhong)經(jing)50 ℃水(shui)浴加熱10 min，后用蒸餾水(shui)清洗。 粗化：將基板放入100 mL/L 濃H2SO4與(yu)1.8 mol/L CrO3 的溶(rong)液中(zhong)經(jing)50 ℃水(shui)浴加熱90 min，后用蒸餾水(shui) 很聲清洗。

敏化：將基板(ban)放入由0.1 mol/L SnCl2、100 mL/L HCl 和金屬(shu)錫粒配(pei)成的溶液中，常溫下敏化10 min， 后用蒸餾水很聲清洗。

活化(hua)：配(pei)(pei)制0.06 mol/L 的AgNO3 溶液(ye)，采用氨 水滴定(ding)至澄清(qing)，將敏(min)化(hua)后(hou)的基板放入常溫下活化(hua)3~5 min，后(hou)用蒸餾水很聲清(qing)洗。 采用四種(zhong)不(bu)同配(pei)(pei)比（分別以(yi)a、b、c、d 表示） 的鍍液(ye)對氧化(hua)鋁(lv)陶瓷基板進行化(hua)學(xue)鍍銅，化(hua)學(xue)鍍銅液(ye) 配(pei)(pei)比見(jian)表1。

在50 ℃恒溫水浴條件下，pH值為12.7，將氧 化鋁陶(tao)瓷基(ji)板放(fang)入(ru)化學鍍銅液中(zhong)，利用(yong)攪拌器鼓入(ru)空氣施鍍1 h。

采用(yong)(yong)X 射(she)線(xian)衍射(she)儀(yi)（丹(dan)東方圓，DX2700，Cu 靶(ba)， 工(gong)作電(dian)壓35 kV，工(gong)作電(dian)流20 mA，掃描速度0.03 (°)/min）對鍍銅(tong)后的氧化鋁(lv)陶(tao)瓷(ci)基板物相進(jin)(jin)(jin)行(xing)分析。采用(yong)(yong)光學顯微鏡（奧(ao)林巴斯，GX71）對氧化鋁(lv)陶(tao)瓷(ci)基板 上的銅(tong)鍍層表(biao)面(mian)進(jin)(jin)(jin)行(xing)觀察(cha)。采用(yong)(yong)涂層測(ce)(ce)厚(hou)儀(yi)（北京(jing)時代集團，TT260）對銅(tong)鍍層膜厚(hou)進(jin)(jin)(jin)行(xing)測(ce)(ce)量。采用(yong)(yong)四探針 測(ce)(ce)試儀(yi)（廣州(zhou)四探針科技，RTS-8）對氧化鋁(lv)陶(tao)瓷(ci)基板 表(biao)面(mian)化學鍍銅(tong)層的方阻進(jin)(jin)(jin)行(xing)測(ce)(ce)定(ding)。

2 結果與分析

2.1 化學鍍銅層的微(wei)結構(gou)

圖1 為不(bu)同(tong)配比(bi)鍍(du)液化學(xue)鍍(du)銅層的XRD圖譜。

從(cong)圖中(zhong)可以(yi)看(kan)出，四種配(pei)比的鍍(du)(du)液得到的化(hua)學(xue)鍍(du)(du)銅(tong)(tong)層主晶相(xiang)(xiang)均(jun)為Cu，這(zhe)說(shuo)明四種配(pei)比鍍(du)(du)液均(jun)可制(zhi)得單一 相(xiang)(xiang)的鍍(du)(du)銅(tong)(tong)層。除Cu 的衍射峰外，還存(cun)在少(shao)量(liang)氧化(hua)鋁 的衍射峰，這(zhe)可能是因為化(hua)學(xue)鍍(du)(du)銅(tong)(tong)過程(cheng)中(zhong)部分細微部位出現孔洞，露出氧化(hua)鋁陶(tao)瓷(ci)基板所致。Cu 衍射峰 比較尖銳，說(shuo)明在氧化(hua)鋁陶(tao)瓷(ci)基板表(biao)面形成的化(hua)學(xue)鍍(du)(du) 銅(tong)(tong)層雖未(wei)經高溫熱(re)處理，但晶化(hua)程(cheng)度較好。此(ci)外，根據謝(xie)樂（Scherrer）公式（1）利用衍射峰的半高寬 （FWHM：full width at half maximum）可以(yi)計算鍍(du)(du)銅(tong)(tong) 層的晶粒尺寸(cun)：

式中(zhong)：D是(shi)晶粒尺(chi)寸（nm），K是(shi)形狀因子（0.89）， λ 是(shi)X 射線的(de)(de)(de)(de)(de)(de)(de)(de)波(bo)長(chang)（Cu 靶為(wei)(wei)(wei)0.15406 nm），β 是(shi)衍(yan)射 峰的(de)(de)(de)(de)(de)(de)(de)(de)半高寬。由公(gong)式（1）計算可(ke)(ke)得(de)(de)(de)，a、b、c、d 四 種配比鍍(du)(du)液(ye)(ye)(ye)(ye)所得(de)(de)(de)鍍(du)(du)銅(tong)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)的(de)(de)(de)(de)(de)(de)(de)(de)晶粒尺(chi)寸分(fen)別(bie)為(wei)(wei)(wei)437、404、 427、315 nm，由此可(ke)(ke)知(zhi)，鍍(du)(du)液(ye)(ye)(ye)(ye)中(zhong)甲醛和硫(liu)酸銅(tong)含(han)(han)量 相(xiang)(xiang)對(dui)較低的(de)(de)(de)(de)(de)(de)(de)(de)d 配比鍍(du)(du)液(ye)(ye)(ye)(ye)可(ke)(ke)制備出晶粒更為(wei)(wei)(wei)細小的(de)(de)(de)(de)(de)(de)(de)(de)化(hua) 學鍍(du)(du)銅(tong)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)。經過(guo)對(dui)衍(yan)射峰進(jin)行歸一化(hua)處理并進(jin)行簡單 定量分(fen)析發(fa)現：采(cai)用a、d 配比鍍(du)(du)液(ye)(ye)(ye)(ye)得(de)(de)(de)到(dao)的(de)(de)(de)(de)(de)(de)(de)(de)含(han)(han)銅(tong)鍍(du)(du)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng) 的(de)(de)(de)(de)(de)(de)(de)(de)氧化(hua)鋁基(ji)板樣(yang)品中(zhong)銅(tong)的(de)(de)(de)(de)(de)(de)(de)(de)含(han)(han)量高于b、c 配比鍍(du)(du)液(ye)(ye)(ye)(ye)， 這間接反映出在同(tong)樣(yang)施(shi)鍍(du)(du)時間下，a、d 配比鍍(du)(du)液(ye)(ye)(ye)(ye)得(de)(de)(de) 到(dao)的(de)(de)(de)(de)(de)(de)(de)(de)鍍(du)(du)銅(tong)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)相(xiang)(xiang)對(dui)較厚(hou)(hou)(hou)。為(wei)(wei)(wei)了證實這一現象，采(cai)用涂層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng) 測(ce)厚(hou)(hou)(hou)儀測(ce)量了a、b、c、d 配比鍍(du)(du)液(ye)(ye)(ye)(ye)制得(de)(de)(de)鍍(du)(du)銅(tong)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)的(de)(de)(de)(de)(de)(de)(de)(de)膜 厚(hou)(hou)(hou)，其(qi)(qi)厚(hou)(hou)(hou)度(du)分(fen)別(bie)為(wei)(wei)(wei)49.6、41.2、36.1、43.2 μm，這與 XRD 的(de)(de)(de)(de)(de)(de)(de)(de)分(fen)析結(jie)果是(shi)一致的(de)(de)(de)(de)(de)(de)(de)(de)。此外(wai)，得(de)(de)(de)到(dao)的(de)(de)(de)(de)(de)(de)(de)(de)鍍(du)(du)銅(tong)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)為(wei)(wei)(wei) 面心立方結(jie)構，經計算得(de)(de)(de)到(dao)采(cai)用a、b、c、d 配比鍍(du)(du) 液(ye)(ye)(ye)(ye)制得(de)(de)(de)的(de)(de)(de)(de)(de)(de)(de)(de)鍍(du)(du)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)銅(tong)的(de)(de)(de)(de)(de)(de)(de)(de)晶格(ge)常(chang)(chang)數分(fen)別(bie)為(wei)(wei)(wei)0.3613、0.36077、0.36075、0.3615 nm，與ICSD 數據庫中(zhong)的(de)(de)(de)(de)(de)(de)(de)(de)銅(tong)（PDF no. 89-2838）的(de)(de)(de)(de)(de)(de)(de)(de)晶格(ge)常(chang)(chang)數0.3615 nm 相(xiang)(xiang)比，a、d 鍍(du)(du)液(ye)(ye)(ye)(ye)配 比得(de)(de)(de)到(dao)的(de)(de)(de)(de)(de)(de)(de)(de)銅(tong)鍍(du)(du)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)與其(qi)(qi)更為(wei)(wei)(wei)相(xiang)(xiang)近，而b、c 鍍(du)(du)液(ye)(ye)(ye)(ye)得(de)(de)(de)到(dao)的(de)(de)(de)(de)(de)(de)(de)(de) 銅(tong)鍍(du)(du)層(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)(ceng)的(de)(de)(de)(de)(de)(de)(de)(de)晶格(ge)常(chang)(chang)數略有(you)所減小。

圖2 為不同配(pei)(pei)比鍍(du)(du)液的(de)化(hua)學鍍(du)(du)銅(tong)層(ceng)(ceng)的(de)宏觀表面(mian) 圖。從圖中可(ke)以看(kan)出(chu)，不同配(pei)(pei)比鍍(du)(du)液的(de)化(hua)學鍍(du)(du)銅(tong)層(ceng)(ceng)均(jun) 勻覆蓋于氧化(hua)鋁基板，表面(mian)并無明(ming)顯差異，b配(pei)(pei)比（鍍(du)(du) 液中甲醛和(he)硫酸銅(tong)含量相對較(jiao)高）鍍(du)(du)液得到的(de)化(hua)學鍍(du)(du) 銅(tong)層(ceng)(ceng)顏色較(jiao)深。

圖(tu)3 為不同配(pei)比(bi)鍍液(ye)所得鍍銅(tong)層(ceng)(ceng)的(de)(de)光學(xue)顯微(wei)圖(tu)。從圖(tu)中(zhong)可以(yi)看(kan)出，b、c配(pei)比(bi)鍍液(ye)的(de)(de)鍍銅(tong)層(ceng)(ceng)表(biao)面(mian)不夠(gou)致密，局(ju)部(bu)存(cun)在空(kong)洞（如圖(tu)3b和(he)3c所示(shi)），而(er)a、d配(pei)比(bi)鍍液(ye)的(de)(de)鍍銅(tong)層(ceng)(ceng)表(biao)面(mian)致密，表(biao)面(mian)沉(chen)積的(de)(de)銅(tong)層(ceng)(ceng)以(yi)顆粒狀排(pai)列(lie)，顆粒表(biao)面(mian)均勻光滑(hua)（如圖(tu)3a和(he)3d所示(shi)）。 根據混合電位理論，利用HCHO作為還原劑需要處于堿性環境，pH數值>11。化(hua)學(xue)鍍銅(tong)過(guo)程涉(she)及 HCHO 的(de)(de)氧化(hua)和(he)二價銅(tong)離子的(de)(de)還原。

甲醛的氧化反應：

銅離子的還原反應：

其中，L 是(shi)配體(ti)，x 是(shi)配位數，p 是(shi)L 所(suo)帶(dai)電荷(he)數。 總反應：

在(zai)(zai)施鍍(du)(du)過程中(zhong)，配比(bi)(bi)b 和(he)(he)c 的(de)(de)(de)(de)(de)鍍(du)(du)液(ye)中(zhong)銅(tong)(tong)(tong)(tong)(tong)離子(zi)含(han)量(liang)(liang)較(jiao)高，在(zai)(zai)陰很(hen)反應(ying)劇烈，使(shi)得(de)表面沉(chen)(chen)積(ji)(ji)(ji)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)層的(de)(de)(de)(de)(de)速度(du)(du)(du)較(jiao)快(kuai)，這(zhe)(zhe)造成(cheng)銅(tong)(tong)(tong)(tong)(tong)粒(li)(li)子(zi)沒能(neng)完全在(zai)(zai)氧化(hua)(hua)鋁(lv)陶瓷(ci)基(ji)板表面分(fen)散均(jun) 勻(yun)，就被其(qi)他沉(chen)(chen)積(ji)(ji)(ji)下(xia)來(lai)(lai)的(de)(de)(de)(de)(de)顆粒(li)(li)覆蓋；同時(shi)(shi)，在(zai)(zai)陽很(hen)發(fa)生的(de)(de)(de)(de)(de)氧化(hua)(hua)反應(ying)中(zhong)，由(you)于產生的(de)(de)(de)(de)(de)氫氣速率過快(kuai)，來(lai)(lai)不及從(cong)基(ji)體表面逸出(chu)(chu)；這(zhe)(zhe)兩方面原(yuan)因共同導致(zhi)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)層有孔隙、氣泡，致(zhi)密(mi)(mi)度(du)(du)(du)降低(di)。而(er)(er)采用銅(tong)(tong)(tong)(tong)(tong)離子(zi)含(han)量(liang)(liang)較(jiao)低(di)的(de)(de)(de)(de)(de)a、d鍍(du)(du)液(ye)時(shi)(shi)，因其(qi)沉(chen)(chen)積(ji)(ji)(ji)速度(du)(du)(du)相對較(jiao)慢(man)，使(shi)銅(tong)(tong)(tong)(tong)(tong)粒(li)(li)子(zi)在(zai)(zai)基(ji)板表面充(chong)分(fen)分(fen)散沉(chen)(chen)積(ji)(ji)(ji)，氫氣有充(chong)足的(de)(de)(de)(de)(de)時(shi)(shi)間從(cong)基(ji)板表面逸出(chu)(chu)，從(cong)而(er)(er)形成(cheng)了(le)均(jun)勻(yun)、致(zhi)密(mi)(mi)的(de)(de)(de)(de)(de)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)層，這(zhe)(zhe)和(he)(he)XRD 分(fen)析結(jie)果一致(zhi)。這(zhe)(zhe)與宋秀(xiu)峰等[6]在(zai)(zai)氧化(hua)(hua)鋁(lv)陶瓷(ci)基(ji)板上化(hua)(hua)學(xue)(xue)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)，再經 900℃熱處理(li)后得(de)到的(de)(de)(de)(de)(de)樣品結(jie)果類似(si)(si)。此(ci)外還發(fa)現，當(dang) 甲醛(quan)(quan)(quan)和(he)(he)銅(tong)(tong)(tong)(tong)(tong)離子(zi)含(han)量(liang)(liang)均(jun)較(jiao)高時(shi)(shi)（b 配比(bi)(bi)鍍(du)(du)液(ye)），鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)層均(jun)勻(yun)性(xing)不好，這(zhe)(zhe)是因為(wei)在(zai)(zai)化(hua)(hua)學(xue)(xue)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)中(zhong)，甲醛(quan)(quan)(quan)作為(wei)還原(yuan)劑(ji)將二(er)價銅(tong)(tong)(tong)(tong)(tong)離子(zi)還原(yuan)為(wei)金屬(shu)銅(tong)(tong)(tong)(tong)(tong)，當(dang)甲醛(quan)(quan)(quan)含(han)量(liang)(liang)較(jiao)高時(shi)(shi)，銅(tong)(tong)(tong)(tong)(tong)粒(li)(li)子(zi)沉(chen)(chen)積(ji)(ji)(ji)速度(du)(du)(du)和(he)(he)氫氣產生的(de)(de)(de)(de)(de)速率均(jun)較(jiao)快(kuai)，這(zhe)(zhe)與銅(tong)(tong)(tong)(tong)(tong)離子(zi)含(han)量(liang)(liang)對沉(chen)(chen)積(ji)(ji)(ji)速度(du)(du)(du)的(de)(de)(de)(de)(de)影響是類似(si)(si)的(de)(de)(de)(de)(de)，因此(ci)，甲醛(quan)(quan)(quan)和(he)(he)銅(tong)(tong)(tong)(tong)(tong)離子(zi)含(han)量(liang)(liang)均(jun)較(jiao)高時(shi)(shi)，沉(chen)(chen)積(ji)(ji)(ji)速度(du)(du)(du)過快(kuai)，從(cong)而(er)(er)使(shi)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)層的(de)(de)(de)(de)(de)均(jun)勻(yun)性(xing)和(he)(he)致(zhi)密(mi)(mi)性(xing)不佳。但當(dang)甲醛(quan)(quan)(quan)含(han)量(liang)(liang)較(jiao)高、銅(tong)(tong)(tong)(tong)(tong)離子(zi)含(han)量(liang)(liang)較(jiao)低(di)時(shi)(shi)（a 配比(bi)(bi)鍍(du)(du)液(ye)），則(ze)可獲得(de)適當(dang)的(de)(de)(de)(de)(de)沉(chen)(chen)積(ji)(ji)(ji)速度(du)(du)(du)，從(cong)而(er)(er)獲得(de)了(le)具有較(jiao)佳均(jun)勻(yun)性(xing)和(he)(he)致(zhi)密(mi)(mi)性(xing)的(de)(de)(de)(de)(de)化(hua)(hua)學(xue)(xue)鍍(du)(du)銅(tong)(tong)(tong)(tong)(tong)層。

2.2化學鍍銅層導(dao)電(dian)性

氧化(hua)鋁陶瓷基板上的(de)(de)鍍(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)需要(yao)具有良好(hao)的(de)(de)導(dao)(dao)電(dian)(dian)(dian)和(he)導(dao)(dao)熱性(xing)能。為(wei)此(ci)，采用四探針測(ce)(ce)試儀對a、b、c、 d 四種(zhong)配(pei)比鍍(du)(du)(du)(du)液制(zhi)(zhi)得鍍(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)的(de)(de)方塊電(dian)(dian)(dian)阻(zu)(zu)進行(xing)測(ce)(ce)試，其 方阻(zu)(zu)分(fen)別為(wei)3、4、5、4 mΩ/□，根據前面所(suo)(suo)(suo)測(ce)(ce)得的(de)(de)鍍(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)的(de)(de)厚度(du)，由公式ρ=R□d（ρ、R□、d 分(fen)別為(wei)電(dian)(dian)(dian)阻(zu)(zu)率、 方阻(zu)(zu)和(he)鍍(du)(du)(du)(du)層(ceng)(ceng)厚度(du)）計算出a、b、c、d 四種(zhong)配(pei)比鍍(du)(du)(du)(du)液 制(zhi)(zhi)得的(de)(de)鍍(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)的(de)(de)電(dian)(dian)(dian)阻(zu)(zu)率分(fen)別為(wei)1.488×10–5、1.648×10–5、1.805×10–5、1.728×10–5 Ω·cm。這說明采用a 配(pei)比鍍(du)(du)(du)(du)液時獲得了導(dao)(dao)電(dian)(dian)(dian)性(xing)能較(jiao)(jiao)好(hao)的(de)(de)鍍(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)，與前面所(suo)(suo)(suo)述采用a 配(pei)比鍍(du)(du)(du)(du)液時所(suo)(suo)(suo)得鍍(du)(du)(du)(du)銅(tong)(tong)(tong)層(ceng)(ceng)的(de)(de)均勻性(xing)和(he)致密性(xing) 較(jiao)(jiao)佳是(shi)直(zhi)接相關的(de)(de)。

3 結論

1）采用表(biao)面活(huo)性鍍(du)銅工(gong)藝，通過對(dui)鍍(du)液(ye)中(zhong)甲醛和(he)銅離子含(han)量(liang)進行優化(hua)，無需高溫熱處(chu)理，在氧化(hua)鋁陶(tao)瓷基板上成功獲得了均勻(yun)性和(he)致密性較佳(jia)、導(dao)電性 較好的鍍(du)銅層。

2）鍍(du)液中較(jiao)高的甲(jia)醛(quan)和(he)(he)銅(tong)(tong)離(li)子(zi)含量會使得(de)銅(tong)(tong)粒子(zi)的沉積(ji)速度過快，從而在陶瓷基(ji)板表面(mian)造成局(ju)部(bu)鍍(du)銅(tong)(tong)粒子(zi)的堆積(ji)，導致(zhi)鍍(du)銅(tong)(tong)層(ceng)致(zhi)密性(xing)和(he)(he)均勻性(xing)不佳。而 采(cai)用較(jiao)高甲(jia)醛(quan)含量和(he)(he)較(jiao)低銅(tong)(tong)離(li)子(zi)含量的鍍(du)液可獲(huo)得(de)合適的銅(tong)(tong)粒子(zi)沉積(ji)速度，從而獲(huo)得(de)較(jiao)佳的鍍(du)銅(tong)(tong)層(ceng)。